Lithography Equipment
Lithography is the cornerstone of semiconductor fabrication, requiring nanometer-level precision in light projection and wafer alignment. Power stability and EMI control are critical to maintaining image fidelity and throughput.
Precision Magnetics for Light-Speed Accuracy: Custom Power Components for Optical and EUV Lithography
Supporting High-Resolution Imaging
Our magnetics are engineered to support laser drivers, optical subsystems, and motion control platforms with high-frequency performance and thermal reliability.
- Planar transformers for compact optical and EUV subsystems
- High-frequency magnetics for laser modulation and beam steering
- Inductors for filtering and EMI suppression in sensitive analog circuits
- Custom assemblies for wafer stage control, alignment, and vibration isolation
Performance Priorities in Optical Precision
- Low-noise operation to preserve optical signal integrity
- Compact integration into densely packed optical and motion control modules
- Thermal stability for consistent performance during long exposure cycles
- High-frequency switching for laser modulation and beam control
Why Lithography OEMs Choose Standex
- Proven performance in EUV and DUV platforms
- Custom planar magnetics for space-constrained optical systems
- In-house testing for EMI, thermal, and dielectric performance
- Cleanroom-compatible materials and construction
