Etching Equipment
Etching systems use high-energy plasma to remove material with extreme precision. These environments are electrically and thermally demanding, requiring magnetics that can handle RF power, voltage spikes, and continuous operation.
Magnetics That Withstand Plasma and Power: Custom Components for Dry Etch and Plasma Systems
Built for Harsh Plasma Environments
Our components are designed for RF generators, impedance matching networks, and chamber control systems—ensuring stable power delivery and long-term durability.
- High-voltage transformers for RF plasma generation
- Inductors for impedance matching and harmonic filtering
- Planar magnetics for compact RF power modules
- Custom assemblies for chamber diagnostics and control electronics
Engineered to Endure Plasma Power
- High-voltage isolation in RF plasma generation
- Thermal endurance under continuous plasma exposure
- Compact RF module integration
- Impedance matching and harmonic filtering
Why Etch OEMs Choose Standex
- Expertise in RF magnetics for plasma systems
- Ruggedized designs for high-temperature, high-voltage operation
- Custom form factors for chamber-mounted electronics
- Fast prototyping for evolving etch tool architectures
